Effect of high gamma doses on the etching behaviour of different types of PADC detectors.

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dc.contributor.authorSinha, D.
dc.contributor.authorMishra, R.
dc.contributor.authorTripathy, S.P.
dc.contributor.authorDwivedi, K.K.
dc.date.accessioned2010-02-04T16:26:04Z
dc.date.available2010-02-04T16:26:04Z
dc.date.issued2010-02-04T16:26:04Z
dc.document.departmentPhysicsen_US
dc.document.sourceRadiation Measurementsen_US
dc.document.yearofpublication2001en_US
dc.identifier.urihttps://dspace.nehu.ac.in/handle/1/369
dc.journal.pagerange139 - 143en_US
dc.journal.volume33en_US
dc.language.isoenen_US
dc.subjectBulk-etch rate; Track-etch rate; Etching efficiency; Critical angle; PADC; 60Co; 252Cf; Gamma dose.en_US
dc.subjectBulk-etch rate; Track-etch rate; Etching efficiency; Critical angle; PADC; 60Co; 252Cf; Gamma dose.en_US
dc.submitter.addressNEHU, SHILLONG.en_US
dc.titleEffect of high gamma doses on the etching behaviour of different types of PADC detectors.en_US
dc.typeArticleen_US
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