Impact of electrons irradiation on particle track etching response in polyallyl diglycol carbonate (PADC).

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dc.contributor.authorMishra, R
dc.contributor.authorTripathy, S.P.
dc.contributor.authorKulshrestha, A.
dc.contributor.authorSrivastava, A.
dc.contributor.authorGhosh, S.
dc.contributor.authorDwivedi, K.K.
dc.contributor.authorKhathing, D.T.
dc.contributor.authorMuller, M.
dc.contributor.authorFink, D.
dc.date.accessioned2010-02-04T16:38:57Z
dc.date.available2010-02-04T16:38:57Z
dc.date.issued2010-02-04T16:38:57Z
dc.document.departmentPhysicsen_US
dc.document.sourcePramana- journal of Physics.en_US
dc.document.yearofpublication2000en_US
dc.identifier.urihttps://dspace.nehu.ac.in/handle/1/370
dc.journal.pagerange777 - 784.en_US
dc.journal.volume54, No 5.en_US
dc.language.isoenen_US
dc.subject2 MeV electrons; 140 MeV 28Si; PADC; Dose-dependent track registration properties; bulk etch-rate; etching response; critical angle of etching; detection efficiency; scanning electrons microcopy.en_US
dc.subject2 MeV electrons; 140 MeV 28Si; PADC; Dose-dependent track registration properties; bulk etch-rate; etching response; critical angle of etching; detection efficiency; scanning electrons microcopy.en_US
dc.submitter.addressNEHU, SHILLONG.en_US
dc.titleImpact of electrons irradiation on particle track etching response in polyallyl diglycol carbonate (PADC).en_US
dc.typeArticleen_US
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