Modification in Etching characteristics and Surface topography of some electrons irradiated polymers.

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dc.contributor.authorMishra, R.
dc.contributor.authorTripathy, S.P.
dc.contributor.authorDwivedi, K.K.
dc.contributor.authorKhathing, D.T.
dc.contributor.authorGhosh, S.
dc.contributor.authorMuller, M.
dc.contributor.authorFink, D.
dc.date.accessioned2010-02-04T15:23:13Z
dc.date.available2010-02-04T15:23:13Z
dc.date.issued2010-02-04T15:23:13Z
dc.document.departmentPhysicsen_US
dc.document.sourceRadiation Measurement.en_US
dc.document.yearofpublication2001en_US
dc.identifier.urihttps://dspace.nehu.ac.in/handle/1/357
dc.journal.pagerange95 - 98en_US
dc.journal.volume34en_US
dc.language.isoenen_US
dc.subjectActivation energy of etching; Bulk etch-rate; Atomic force microscopy; Surfacs roughness.en_US
dc.subjectActivation energy of etching; Bulk etch-rate; Atomic force microscopy; Surfacs roughness.en_US
dc.submitter.addressNEHU, SHILLONG.en_US
dc.titleModification in Etching characteristics and Surface topography of some electrons irradiated polymers.en_US
dc.typeArticleen_US
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