Transport processes during the incubation time of ion track etching in polymers

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dc.contributor.authorFink, D
dc.contributor.authorGhosh, S
dc.contributor.authorKlett, R
dc.contributor.authorDwivedi, K K
dc.contributor.authorKobayashi, Y
dc.contributor.authorHirata, K
dc.contributor.authorVacik, J
dc.contributor.authorHnatowicz, V
dc.contributor.authorCervena, J
dc.contributor.authorChadderton, L T
dc.date.accessioned2010-08-18T06:16:24Z
dc.date.available2010-08-18T06:16:24Z
dc.date.issued2010-08-18T06:16:24Z
dc.document.departmentDepartment of Chemistryen_US
dc.document.sourceNuclear Instruments and Methods in Physics Research Ben_US
dc.document.yearofpublication1998en_US
dc.identifier.urihttps://dspace.nehu.ac.in/handle/1/2764
dc.journal.pagerange486-490en_US
dc.journal.volume146en_US
dc.language.isoenen_US
dc.subjectPolymersen_US
dc.subjectPeeken_US
dc.subjectPolyimideen_US
dc.subjectPBTen_US
dc.subjectIon tracksen_US
dc.subjectEtchingen_US
dc.subjectIncubation timeen_US
dc.subjectDiffusionen_US
dc.subjectSwelling free volumesen_US
dc.subjectDepth profilesen_US
dc.subjectPositron annihilation spectroscopyen_US
dc.submitter.addressNEHU, SHILLONG 793022en_US
dc.titleTransport processes during the incubation time of ion track etching in polymersen_US
dc.typeArticleen_US
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