Proton dose-dependent modification in track etching response in some polymers.

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dc.contributor.authorTripathy, S. P
dc.contributor.authorMishra, R.
dc.contributor.authorDwivedi, K.K
dc.contributor.authorKhathing, D.T.
dc.contributor.authorGhosh, S.
dc.contributor.authorFink, D.
dc.date.accessioned2010-02-04T12:01:16Z
dc.date.available2010-02-04T12:01:16Z
dc.date.issued2010-02-04T12:01:16Z
dc.document.departmentPhysicsen_US
dc.document.sourceRadiation Measurementsen_US
dc.document.yearofpublication2003en_US
dc.identifier.urihttps://dspace.nehu.ac.in/handle/1/315
dc.journal.pagerange107 - 110en_US
dc.journal.volume36en_US
dc.language.isoenen_US
dc.subjectMakrofol-N; Polyimide; Proton irradiation; Bulk etch-rate; Activation energy.en_US
dc.subjectMakrofol-N; Polyimide; Proton irradiation; Bulk etch-rate; Activation energy.en_US
dc.submitter.addressNEHU, SHILLONG.en_US
dc.titleProton dose-dependent modification in track etching response in some polymers.en_US
dc.typeArticleen_US
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