Please use this identifier to cite or link to this item: http://dspace.nehu.ac.in/handle/1/370
Title: Impact of electrons irradiation on particle track etching response in polyallyl diglycol carbonate (PADC).
Authors: Mishra, R
Tripathy, S.P.
Kulshrestha, A.
Srivastava, A.
Ghosh, S.
Dwivedi, K.K.
Khathing, D.T.
Muller, M.
Fink, D.
Keywords: 2 MeV electrons; 140 MeV 28Si; PADC; Dose-dependent track registration properties; bulk etch-rate; etching response; critical angle of etching; detection efficiency; scanning electrons microcopy.
2 MeV electrons; 140 MeV 28Si; PADC; Dose-dependent track registration properties; bulk etch-rate; etching response; critical angle of etching; detection efficiency; scanning electrons microcopy.
Issue Date: 4-Feb-2010
URI: http://dspace.nehu.ac.in/handle/1/370
Appears in Collections:S P Tripathy

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